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CHARACTERIZATION OF SILICON CARBIDE THIN FILMS DEPOSITED BNY LASER ABLATION ON [001] AND [111] SILICON WAFERS

著者名:
掲載資料名:
Wide band gap semiconductors : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
242
発行年:
1992
開始ページ:
549
終了ページ:
554
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991361 [1558991360]
言語:
英語
請求記号:
M23500/242
資料種別:
国際会議録

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