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AN INVESTIGATION INTO THE USE OF A DIFFUSION BARRIER IN THE MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND ON IRON BASED SUBSTRATES

著者名:
Weiser, Paul S.
Prawer, S.
Hoffman, A.
Manory, R.
Paterson, P.J.K.
Stuart, S-A.
さらに 1 件
掲載資料名:
Wide band gap semiconductors : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
242
発行年:
1992
開始ページ:
63
終了ページ:
68
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991361 [1558991360]
言語:
英語
請求記号:
M23500/242
資料種別:
国際会議録

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