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THERMAL DEGRADATION OF SiGe INTERFACES STUDIED BY X-RAY REFLECTIVITY AND DIFFRACTION

著者名:
Hudson, , J. M.
Powell, A. R.
Bowen, D. K.
Wormington, M.
Tanner, B. K.
Kubiak, R. A.
Parker, E. H. C.
さらに 2 件
掲載資料名:
Thin films : stresses and mechanical properties III : symposium held December 2-5, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
239
発行年:
1992
開始ページ:
455
終了ページ:
460
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991330 [1558991336]
言語:
英語
請求記号:
M23500/239
資料種別:
国際会議録

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