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ORIENTATION DEPENDENT EPITAXIAL GROWTH OF CeO2 LAYERS ON Si SUBSTRATES

著者名:
Inoue, T.
Ohsuna, T.
Yamamoto, Y.
Sakurai, Y.
Luo, L.
Wu, X. D.
Maggiore, C. J.
さらに 2 件
掲載資料名:
Interface dynamics and growth : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
237
発行年:
1992
開始ページ:
589
終了ページ:
594
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991316 [155899131X]
言語:
英語
請求記号:
M23500/237
資料種別:
国際会議録

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