LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA
- 著者名:
- 掲載資料名:
- Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 236
- 発行年:
- 1992
- 開始ページ:
- 319
- 終了ページ:
- 324
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991309 [1558991301]
- 言語:
- 英語
- 請求記号:
- M23500/236
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Electrochemical Society |
Electrochemical Society |
MRS-Materials Research Society |
MRS - Materials Research Society |
9
国際会議録
SILICON NITRIDE DEPOSITED AT VERY LOW SILANE PRESSURES USING ELECTRON CYCLOTRON RESONANCE PLASMAS
Materials Research Society |
Electrochemical Society | |
MRS - Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |