RESISTLESS ETCHING OF SiO2 BY TWO COLOR EXCIMER LASERS

RESISTLESS ETCHING OF SiO2 BY TWO COLOR EXCIMER LASERS

著者名:

掲載資料名:

Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

236

発行年:

1992

開始ページ:

65

終了ページ:

70

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991309 [1558991301]

言語:

英語

請求記号:

M23500/236

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015720
シリーズID:	PA00000011
会議名:	Symposium on photons and low energy particles in surface processing
回次:	1991
会議開催地:	Boston, MA, USA
会議開催年:	1991.12.03-1991.12.06

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