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AN INVESTIGATION OF BURIED LAYER FORMATION BY 40keV OXYGEN IMPLANTATION INTO SILICON

著者名:
Li, Y.
Kilner, A.
Chater, R. J.
Tate, T. J.
Hemment, P. L. F.
Nejim, A.
さらに 1 件
掲載資料名:
Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
235
発行年:
1992
開始ページ:
115
終了ページ:
120
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991293 [1558991298]
言語:
英語
請求記号:
M23500/235
資料種別:
国際会議録

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