PROPERTIES OF Si02 FILMS FABRICATED BY MICROWAVE ECR PLASMA PROCESSING WITH AND WITHOUT ENERGETIC PARTICLE BOMBARDMENT DURING FILM DEPOSITION PART I. FABRICATION PROCESSES AND PHYSICAL PROPERTIES

PROPERTIES OF Si02 FILMS FABRICATED BY MICROWAVE ECR PLASMA PROCESSING WITH AND WITHOUT ENERGETIC PARTICLE BOMBARDMENT DURING FILM DEPOSITION PART I. FABRICATION PROCESSES AND PHYSICAL PROPERTIES

著者名:

掲載資料名:

Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

223

発行年:

1991

開始ページ:

69

終了ページ:

74

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991170 [1558991174]

言語:

英語

請求記号:

M23500/223

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015707
シリーズID:	PA00000011
会議名:	Symposium on low energy ion beam and plasma modification of materials
回次:	1991
会議開催地:	Anaheim, CA, USA
会議開催年:	1991.04.30-1991.05.02

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