INTERFACE STRUCTURE OF Ge/Si SUPERLATTICES DETERMINED BY X-RAY ABSORPTION FINE STRUCTURE
- 著者名:
Aebi, P. Tyliszczak, T. Hitchcock, A.P. Baribeau, J.-M. Lockwood, D.L. Jackman, T.E. - 掲載資料名:
- Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 220
- 発行年:
- 1991
- 開始ページ:
- 253
- 終了ページ:
- 258
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991149 [155899114X]
- 言語:
- 英語
- 請求記号:
- M23500/220
- 資料種別:
- 国際会議録
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9
国際会議録
Fabrication and Structural and Optical Properties of Amorphous Si/SiO2 Superlattices on (100) Si
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