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EXCIMER LASER CRYSTALLIZED AMORPHOUS SILICON FILMS: EFFECTS OF SHOT DENSITY AND SUBSTRATE TEMPERATURE

著者名:
掲載資料名:
Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
219
発行年:
1991
開始ページ:
407
終了ページ:
412
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991132 [1558991131]
言語:
英語
請求記号:
M23500/219
資料種別:
国際会議録

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