Blank Cover Image

EVOLUTION OF STRESS DURING FORMATION OF TITANIUM DISILICIDE BY RTA AND TUBE FURNACE ANNEALING

著者名:
掲載資料名:
Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
202
発行年:
1991
開始ページ:
265
終了ページ:
270
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990944 [1558990941]
言語:
英語
請求記号:
M23500/202
資料種別:
国際会議録

類似資料:

1 国際会議録 STRESS IN TITANIUM DISILICIDE LAYER, DURING AND AFTER FORMATION

Jongste,J. F., Prins, F.E., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
7 国際会議録 Mechanical Behavior of AlNiCr Blanket Films and Stacks of Films During Thermal Cycling

Lokker, J.P., Janssen, G.C.A.M., Radelaar, S.

Electrochemical Society
2 国際会議録 IN SITU STRESS MEASUREMENTS DURING THE FORMATION OF TiSi2 C49 ON Si WAFERS

Jongste, J. F., Janssen, G. C. A. M., Radelaar, S.

Materials Research Society
8 国際会議録 EVOLUTION OF INTRINSIC STRESS DURING NUCLEATION AND GROWTH OF POLYCRYSTALLINE TUNGSTEN FILMS BY CHEMICAL VAPOR DEPOSITION

Leusink, G. J., Oosterlaken, T. G. M., Janssen, G. C. A.M., Radelaar, S.

Materials Research Society
3 国際会議録 In-situ wafer curvature measurements during rapid thermal annealing of Si(100)wafers

Jongste,J.F., Oosterlaken,T.G.M., Bart,G.C.J., Janssen,G.C.A.M., Radelaar,S.

SPIE-The International Society for Optical Engineering
9 国際会議録 The Kinetics of Tungsten Deposition from a H2/WF6- Mixture Studied by In-Situ Laser Raman Scattering

Oosterlaken, T.G.M., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S.

Electrochemical Society
4 国際会議録 IN SITU STRESS MEASUREMENTS DURING THE REACTION OF WF6 WITH Si(100)

Leusink, G.J., Heerkens, C.Th.H., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
10 国際会議録 Influence of Substrate Temperature During Sputter Deposition on the Subsequent Formation of Titanium Disilicide

Ozcan, A.S., Ludwig Jr., K.F., Cabral Jr., C., Lavoie, C., Harper, J.M.E.

Materials Research Society
5 国際会議録 Isothermal Stress Relaxation in Al, AlCu and AlVPd Films

Lokker, J. P., Jongste, J. F., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
11 国際会議録 SELECTIVE CHEMICAL VAPOUR DEPOSITION OF TUNGSTEN USING SiH4WF6 CHEMISTRY

van der Jeugd, C.A., Verbruggen, A.H., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
6 国際会議録 Isothermal Stress Relaxation in Al, AlCu and AlVPd Films

Lokker, J. P., Jongste, J. F., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
12 国際会議録 Stress and Texture in Sputter Deposited Cr Films

Grachev, S. Yu., Kamminga, J.-D., Janssen, G.C.A.M.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12