CoSi2 PRECIPITATE COARSENING DURING FORMATION OF BURIED EPITAXIAL CoSi2 LAYERS BY ION BEAM SYNTHESIS
- 著者名:
Jebasinski, R. Mantl, S. Radermacher, K. Fichtner, P. Jager, W. Buchal, Ch. - 掲載資料名:
- Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 201
- 発行年:
- 1991
- 開始ページ:
- 411
- 終了ページ:
- 416
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990074 [1558990070]
- 言語:
- 英語
- 請求記号:
- M23500/201
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
THICKNESS DEPENDENCE OF ELECTRICAL TRANSPORT IN BURIED CoSi2 FILMS FABRICATED BY ION BEAM SYNTHESIS
MRS - Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Kluwer Academic Publishers |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Kluwer Academic Publishers |
11
国際会議録
CHANNELING INVESTIGATION OF THE LATTICE LOCATION OF Ti IN Ti-IMPLANTED OPTICAL WAVEGUIDES IN LiNbO3
Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |