Blank Cover Image

SUPPRESSION OF CRYSTAL NUCLEATION IN AMORPHOUS Si THIN FILMS BY HIGH ENERGY ION IRRADIATION AT INTERMEDIATE TEMPERATURES

著者名:
掲載資料名:
Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
201
発行年:
1991
開始ページ:
357
終了ページ:
362
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990074 [1558990070]
言語:
英語
請求記号:
M23500/201
資料種別:
国際会議録

類似資料:

1 国際会議録 SUPPRESSION OF CRYSTAL NUCLEATION IN AMORPHOUS Si THIN FILMS BY HIGH ENERGY ION IRRADIATION AT INTERMEDIATE TEMPERATURES

Im, James S., Shin, Jung H., Atwater, Harry A.

Materials Research Society
7 国際会議録 LOW ENERGY ION BOMBARDMENT AND MICROSTRUCTURAL EVOLUTION IN THIN FILMS

Yang, Chih M., Atwater, Harry A.

Materials Research Society
2 国際会議録 CRYSTAL NUCLEATION IN AMORPHOUS Si THIN FILMS DURING ION IRRADIATION

Im, James S., Atwater, Harry A.

Materials Research Society
8 国際会議録 CRYSTAL STABILITY AND MICROSTRUCTURAL EVOLUTION IN POLYCRYSTALLINE Si FILSM DURING ION IRRADIATION

Atwater, Harry A., Brown, Walter L.

Materials Research Society
3 国際会議録 ION IRRADIATED AMORPHOUS SILICON: A MODEL APPROACH TO DYNAMICS OF DEFECT CREATION AND ANNIHILATION

Shin, Jung H., Atwater, Harry A.

MRS - Materials Research Society
9 国際会議録 Polycrystalline Si Films Fabricated by Low-Temperature Selective Nucleation and solid-Phase Epitaxy Process

Chen, Claudine M., Atwater, Harry A.

MRS - Materials Research Society
4 国際会議録 STABILITY OF NANOMETER-SIZE Si CRYSTALS IN AMORPHOUS Si THIN FILMS UNDER ION IRRADIATION

Yang, Chih M., Atwater, Harry A.

MRS - Materials Research Society
10 国際会議録 ION BEAM ENHANCED GRAIN GROWTH IN THIN FILMS

Atwater, Harry A., Thompson, Carl V., Smith, Henry T.

Materials Research Society
5 国際会議録 Generalized activation energy spectrum theory: a new approach for modeling structural relaxation in amorphous solids

Shin, Jung H., Atwater, Harry A.

MRS - Materials Research Society
11 国際会議録 Controlled Grain Size and Location in Ge Thin Films on Silicon Dioxide by Low Temperature Selective Solid Phase Crystallization

Yang, C. M., Atwater, Harry A.

MRS - Materials Research Society
6 国際会議録 DYNAMICS OF CHANGE IN ELECTRICAL CONDUCTIVITY OF ION IRRADIATED AMORPHOUS SILICON

Shin, Jung H., Im, J. S., Atwater, H. A.

Materials Research Society
12 国際会議録 In Situ Biaxial Texture Analysis of MgO Films During Growth on Amorphous Substrates by Ion Beam-Assisted Deposition

Brewer, Rhett T., Arendt, Paul N., Groves, James R., Atwater, Harry A.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12