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DOES ION BOMBARDMENT INDUCE A DEGRADATION OF THE ELECTRONIC PROPERTIES OF a-Si:H FILMS?

著者名:
Cabarrocas, i Roca, P.
Morin, P.
Conde, J.
Chu, V.
Liu, J. Z.
Park, H. R.
Wagner, S.
さらに 2 件
掲載資料名:
Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
192
発行年:
1990
開始ページ:
745
終了ページ:
750
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990814 [155899081X]
言語:
英語
請求記号:
M23500/192
資料種別:
国際会議録

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