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EFFECTS OF INTERFACES ON THE a-Si:H SCHOTTKY BARRIER CHARACTERISTICS

著者名:
Li, Y. M.
Malone, C.
Kumar, S.
Wronski, C. R.
Nguyen, H. V.
Collins, R W.
さらに 1 件
掲載資料名:
Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
192
発行年:
1990
開始ページ:
219
終了ページ:
224
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990814 [155899081X]
言語:
英語
請求記号:
M23500/192
資料種別:
国際会議録

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