GEOMETRICAL EFFECTS AND DISINTEGRATION OF NARROW TiSi2 /POLY-Si LINES
- 著者名:
- 掲載資料名:
- Advanced metallizations in microelectronics : symposium held April 16-20, 1990, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 181
- 発行年:
- 1990
- 開始ページ:
- 173
- 終了ページ:
- 178
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990708 [1558990704]
- 言語:
- 英語
- 請求記号:
- M23500/181
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
Trans Tech Publications |
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
11
国際会議録
CHARACTERIZATION OF DOPE Si-TiSi2 BILAYERS FORMED BY ION BEAM MXING AND RAPID THERMAL ANNEALING
Materials Research Society |
MRS - Materials Research Society |
12
国際会議録
The Detrimental Effect of a Passivation on the Electromigration Lifetime of Narrow Al-Si-Cu Lines
MRS - Materials Research Society |