*APPLICATIONS OF AMORPHOUS Ti-P-N DIFFUSION BARRIERS IN SILICON METALLIZATION

*APPLICATIONS OF AMORPHOUS Ti-P-N DIFFUSION BARRIERS IN SILICON METALLIZATION

著者名:

掲載資料名:

Advanced metallizations in microelectronics : symposium held April 16-20, 1990, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

181

発行年:

1990

開始ページ:

33

終了ページ:

40

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990708 [1558990704]

言語:

英語

請求記号:

M23500/181

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015665
シリーズID:	PA00000011
会議名:	Symposium on advanced metallizations in microelectronics
回次:	1990
会議開催地:	San Francisco, CA, USA
会議開催年:	1990.04.16-1990.04.20

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