LOW-TEMPERATURE CHEMICAL VAPOR DEPOSITION OF RHODIUM AND IRIDIUM THIN FILMS

LOW-TEMPERATURE CHEMICAL VAPOR DEPOSITION OF RHODIUM AND IRIDIUM THIN FILMS

著者名:

Smith, David C.

Sattelberger, Alfred P.

さらに 2 件

掲載資料名:

Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

168

発行年:

1990

開始ページ:

369

終了ページ:

374

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990562 [1558990569]

言語:

英語

請求記号:

M23500/168

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015652
シリーズID:	PA00000011
会議名:	Symposium on chemical vapor deposition of refractory metals and ceramics
回次:	1989
会議開催地:	Boston, MA, USA
会議開催年:	1989.11.29-1989.12.01

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