POLYHYRIDE BONDING GROUPS IN PECVD AMORPHOUS Si THIN FILMS
- 著者名:
- 掲載資料名:
- Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 165
- 発行年:
- 1990
- 開始ページ:
- 173
- 終了ページ:
- 180
- 総ページ数:
- 8
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990531 [1558990534]
- 言語:
- 英語
- 請求記号:
- M23500/165
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
ANNEALING OF IRREVERSIBLE DEFECTS IN HYDROGENATED AND UNHYDROGENATED AMORPHOUS SILISON THIN FILMS
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
5
国際会議録
a-Si:H THIN FILM TRANSISTORS AND LOGIC CIRCUITS FABRICATED IN AN INTEGRATED MULTICHAMBER SYSTEM
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |