ELECTRON SPIN RESONANCE STUDIES OF SILICON DIOXIDE FILMS ON SILICON IN INTEGRATED CIRCUITS USING SPIN DEPENDENT RECOMBINATION

ELECTRON SPIN RESONANCE STUDIES OF SILICON DIOXIDE FILMS ON SILICON IN INTEGRATED CIRCUITS USING SPIN DEPENDENT RECOMBINATION

著者名:

掲載資料名:

Atomic scale structure of interfaces : symposium held November 27-29, 1989, Boston Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

159

発行年:

1990

開始ページ:

191

終了ページ:

196

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990470 [155899047X]

言語:

英語

請求記号:

M23500/159

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015643
シリーズID:	PA00000011
会議名:	Symposium on atomic scale structure of interfaces
回次:	1989
会議開催地:	Boston, MA, USA
会議開催年:	1989.11.27-1989.1129

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