EXCIMER LASER-ASSISTED ETCHING OF SILICON USING CHLOROPENTAFLUOROETHANE

EXCIMER LASER-ASSISTED ETCHING OF SILICON USING CHLOROPENTAFLUOROETHANE

著者名:

掲載資料名:

In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

158

発行年:

1990

開始ページ:

325

終了ページ:

330

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990463 [1558990461]

言語:

英語

請求記号:

M23500/158

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015642
シリーズID:	PA00000011
会議名:	Symposium on in-situ patterning
回次:	1989
会議開催地:	Boston, MA, USA
会議開催年:	1989.11.29-1989.12.01

類似資料:

1 国際会議録 193-NM EXCIMER LASER-ASSISTED ETCHING OF POLYSILICON Armacost, M.D., Babu, S.V., Nguyen, S.V., Rembetski, J.F. Materials Research Society	7 国際会議録 Excimer Laser Patterning and Etching of Metals Key H. P., Dyer E. P., Greenough D. R. Martinus Nijihoff Publishers
2 国際会議録 193-nm EXCIMER LASER-ASSISTED ETCHING OF POLYSILICON FILMS USING Cl2 Nguyen, S. V., Fridmann, S., Remberski, J. Materials Research Society	8 国際会議録 BORON DOPING OF SILICON USING EXCIMER LASERS Slaoui, A., Foulon, F., Bianconi, M., Correra, L., Nipoti, R., Stuck, R., Unamuno, S., Fogarassy, E., Nicoletti, S. Materials Research Society
3 国際会議録 Photo-Chemical Pattern Etching of Silicon-Carbide by Using Excimer Laser and Hydrogen Peroxide Solution Sasaki, D., Murahara, M. Materials Research Society	9 国際会議録 EXCIMER LASER ETCHING OF CUPRIC OXIDE van Veen, G. N. A., Vrijmoeth, W., Baller, T. S., Dieleman Materials Research Society
4 国際会議録 SILICON HOMOEPITAXY AT 300°C USING ArF EXCIMER LASER PHOTOLYSIS OF DISILANE Fowler, B., Lian, T., Bullock, D., Banerjee, S. Materials Research Society	10 国際会議録 HOLOGRAPHIC PATTERN ETCHING OF SILICON-CARBIDE BY EXCIMER LASER Murahara, M., Yonekawa, M., Shirakawa, K. Materials Research Society
5 国際会議録 Laser-Assisted Wes Etching of Silicon Lim, P., Brock, J.R., Trachtenberg, I. American Institute of Chemical Engineers	11 国際会議録 EXCIMER LASER INDUCED ETCHING OF SILICON-CARBIDE Murahara, M., Arai, H., Matsumura, T. Materials Research Society
6 国際会議録 Photo-Chemical Etching on Silicon-Carbide by Using KrF Excimer Laser and Xe2 Excimer Lamp* Hasegawa, K., Murahara, M. MRS - Materials Research Society	12 国際会議録 Aspheric surface figuring of silicon using plasma-assisted chemical etching S.J. Hoskins, B.A. Scott Society of Photo-optical Instrumentation Engineers

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