PHOSPHORUS DOPING INTO SILICON USING ArF EXCIMER LASER

PHOSPHORUS DOPING INTO SILICON USING ArF EXCIMER LASER

著者名:

掲載資料名:

In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

158

発行年:

1990

開始ページ:

281

終了ページ:

288

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990463 [1558990461]

言語:

英語

請求記号:

M23500/158

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015642
シリーズID:	PA00000011
会議名:	Symposium on in-situ patterning
回次:	1989
会議開催地:	Boston, MA, USA
会議開催年:	1989.11.29-1989.12.01

類似資料:

1 国際会議録 PHOSPHORUS AND BORON DOPING OF SILICON THIN FILMS USING ArF EXCIMER LASER Slaoui, A., Pattyn, H., Fogarassy, E., De Unamuno, S., Stuck, R. Materials Research Society	7 国際会議録 HIGH ENERGY HEAVY IONS IRRADIATION OF THERMAL SiO2 FILMS ON Si Slaoui, Abdelilah, Busch, Marie-Claude, Doorhyee, Eric, Toulemonde, Marcel, Siffert, Paul Materials Research Society
2 国際会議録 ArF EXCIMER LASER DOPING INTO AMORPHOUS SILICON THIN FILMS Elliq, M., Slaoui, A., Fogarassy, E., Pattyn, H., Struck, R., Siffert, P. Materials Research Society	8 国際会議録 UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime Fogarassy E., Slaoui A., Fuchs C. Martinus Nijihoff Publishers
3 国際会議録 BORON DOPING OF SILICON USING EXCIMER LASERS Slaoui, A., Foulon, F., Bianconi, M., Correra, L., Nipoti, R., Stuck, R., Unamuno, S., Fogarassy, E., Nicoletti, S. Materials Research Society	9 国際会議録 TWO-PHOTON ABSORPTION CROSS SECTION FOR SILANE UNDER PULSED ArF (193 nm) EXCIMER LASER IRRADIATION Fuchs, C., Boch, E., Fogarassy, E., Aka, B., Siffert, P. Materials Research Society
4 国際会議録 PHOSPHORUS GLASS DOPING OF POLYCRYSTALLINE SILICON DURING RAPID THERMAL ANNEALING Hartiti, Bouchaib, Slaoui, Abdelilah, Stuck, Roland, Muller, Jean-Claude, Siffert, Paul Materials Research Society	10 国際会議録 PHOSPHORUS GETTERING BY RAPID THERMAL PROCESSING Hartiti, Bouchaib, Slaoui, Abdelilah, Muller, Jean-Claude, Siffeert, Paul Materials Research Society
5 国際会議録 OPTICAL PROPERTIES OF LASER INDUCED HEAVILY DOPED SILICON LAYERS Slaoui, A., Fogarassy, E., Siffert, P., Morphange, J. F., Balkanski, M. North-Holland	11 国際会議録 Fabrication of p+/n Ultra-Shallow Junctions (USJ) in Silicon by Excimer Laser Doping From Spin-On Glass Sources Coutanson, S., Fogarassy, E., Venturini, J. Materials Research Society
6 国際会議録 A COMPARISON OF THE GAS PHASE PROCESSES RESULTING FROM SiH4 AND Si2H6 PHOTODISSOCIATION WITH A PULSED ArF EXCIMER LASER Boch, E., Fuchs, C., Fogarassy, E., Siffert, P. Materials Research Society	12 国際会議録 PULSED EXCIMER LASER DEPOSITION OF YBaCuO AND BiSrCaCuO COMPOUNDS: MATERIAL DISTRIBUTION AND STOICHIOMETRY Fuchs, Claude, Fogarassy, Eric Materials Research Society

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