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GROWTH OF CRYSTALLINE SILICON, MICROCRYSTALLINE AND EPITAXIAL AT LOW SUBSTRATE TEMPERATURE

著者名:
Tanabe, H.
Azuma, A.
Uematsu, T.
Shirai, H.
Hanna, J.
Shimizu, I.
さらに 1 件
掲載資料名:
Amorphous silicon technology, 1989 : symposium held April 25-28, 1989, San Diego, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
149
発行年:
1989
開始ページ:
17
終了ページ:
22
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558990227 [1558990224]
言語:
英語
請求記号:
M23500/149
資料種別:
国際会議録

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