STRESS GRADIENTS IN SiO2 THIN FILMS PREPARED BY THERMAL OXIDATION AND SUBJECTED TO RAPID THERMAL ANNEALING
- 著者名:
- 掲載資料名:
- Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 146
- 発行年:
- 1989
- 開始ページ:
- 197
- 終了ページ:
- 202
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990197 [1558990194]
- 言語:
- 英語
- 請求記号:
- M23500/146
- 資料種別:
- 国際会議録
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3
国際会議録
THE EFFECT OF INTRINSIC IN-PLANE STRESS ON THE LOCAL ATOMIC STRUCTURE OF THEMALLY GROWN SIO2
Materials Research Society | |
Materials Research Society |
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