LASER-INDUCED ATOMIC CHLORINE ETCHING OF SILICON

LASER-INDUCED ATOMIC CHLORINE ETCHING OF SILICON

著者名:

掲載資料名:

Laser and particle-beam chemical processes on surfaces : symposium held November 29-December 2, 1988, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

129

発行年:

1989

開始ページ:

291

終了ページ:

298

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990029 [155899002X]

言語:

英語

請求記号:

M23500/129

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015614
シリーズID:	PA00000011
会議名:	Symposium on laser and particle-beam chemical processes on surfaces
回次:	1988
会議開催地:	Boston, MA, USA
会議開催年:	1988.11.29-1988.12.02

類似資料:

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