PLASMA-ACTIVATED ION BEAM REACTIVE SPUTTERING OF NbN THIN FILMS

PLASMA-ACTIVATED ION BEAM REACTIVE SPUTTERING OF NbN THIN FILMS

著者名:

掲載資料名:

Processing and characterization of materials using ion beams : symposium held November 28-December 2, 1988, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

128

発行年:

1989

開始ページ:

67

終了ページ:

72

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558990012 [1558990011]

言語:

英語

請求記号:

M23500/128

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015613
シリーズID:	PA00000011
会議名:	Symposium on processing and characterization of materials using ion beams
回次:	1988
会議開催地:	Boston, MA, USA
会議開催年:	1988.11.28-1988.12.02

類似資料:

1 国際会議録 USE OF ION SCATTERING SPECTROSCOPY TO MONITOR THE Nb TARGET NITRIDATION DURING REACTIVE SPUTTERING Lichtenwalner, D.J., Anderson, A.C., Rudman, D.A. Materials Research Society	7 国際会議録 Ion beam sputter deposition of zirconia thin films W. Jin, C. Jin, L. Liu, H. Zhu, H. Yang Society of Photo-optical Instrumentation Engineers
2 国際会議録 SCANNING TUNNELING MICROSCOPY AND SPECTROSCOPY OF Y-Ba-Cu-O THIN FILMS PRODUCED BY ION BEAM SPUTTER DEPOSITION Chapman, R.C., Auciello, O., Lichtenwalner, D.J., Adu, R.P., Soble II, C.N., Christensen, K.N., Woolcott, Jr., R.R., … Materials Research Society	8 国際会議録 *MICROSTRUCTURAL CHARACTERIZATION OF EPITAXIAL BOTTOM ELECTRODES, BUFFER LAYERS, AND FERROELECTRIC THIN FILMS Rou, S.H., Graettinger, T.M., Chow, A.F., Soble, II, C.N., Lichtenwalner, D.J., Auciello, O., Kingon, A.I. Materials Research Society
3 国際会議録 ION-BEAM REACTIVE SPUTTER DEPOSITION OF MgO THIN FILMS ON SILICON AND SAPPHIRE SUBSTRATES Chow, Alice F., Rou, Shang Hsieh, Lichtenwalner, Daniel J., Auciello, Orlando, Kingon, Angus I. Materials Research Society	9 国際会議録 MODELLING OF MULTI-ION-BEAM REACTIVE COSPUTTERING FOR METAL OXIDE THIN FILMS Xiao, D. Q., Zhu, J. G., Qian, Z. H., Peng, W. B., Wei, L. F., Li, Z. S. MRS - Materials Research Society
4 国際会議録 Effect of Assisted-Ion-Beam Gases on the Structure of Amorphous Silicon Thin Films Prepared by Ion-Beam-Assisted Sputtering J.J. Huang, C.M. Gui, M. Ding, D.F. Zhao, C.L. Han Trans Tech Publications	10 国際会議録 GROWTH OF TETRAHEDRAL PHASES OF BORON NITRIDE THIN FILMS BY REACTIVE SPUTTERING Moustakas, T.D., Lei, T., Molnar, R.J., Fountzoulas, C., Oles, E.J. Materials Research Society
5 国際会議録 Ion Beam Reactive Sputter-Deposition of Silicon and Zirconium Oxides Pringle, S. D., Valizadeh, R., Colligon, J. S., Faunce, C. A., Kheyrandish, H. MRS - Materials Research Society	11 国際会議録 AlN thin films prepared by reactive ion beam coating Cheng, L. L., Yu, Y. H., Sundaravel, B., Luo, E. Z., Lin, S., Lei, Y. M., Ren. C. X., Cheung, W. Y., Wong, S. P., Xu, J. … MRS-Materials Research Society
6 国際会議録 Vanadium Oxide Thin Films Synthesized by Reactive Ion Beam Sputter Deposition: Influence of Processing Parameters C. Batista, R.M. Ribeiro, V. Teixeira Trans Tech Publications	12 国際会議録 A Roll-to-Roll Reactive Ion Etching Process for Microtexturing of Polymer Film Surfaces D.J. McClure Society of Vacuum Coaters

1

2

3

4

5

6

7

8

9

10

11

12