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EVOLUTION OF STRESS DURING INTERFACIAL REACTIONS BETWEEN Ni THIN FILMS AND (001) Si SUBSTRATES

著者名:
掲載資料名:
Interfacial structure, properties, and design : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
122
発行年:
1988
開始ページ:
573
終了ページ:
578
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837920 [0931837928]
言語:
英語
請求記号:
M23500/122
資料種別:
国際会議録

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