COMPARISON OF LIGHT-INDUCED DEGRADATION IN LOW AND HIGH-RATE DEPOSITED VHF-GD a-Si:H: EFFECT OF FILM INHOMOGENEITIES

COMPARISON OF LIGHT-INDUCED DEGRADATION IN LOW AND HIGH-RATE DEPOSITED VHF-GD a-Si:H: EFFECT OF FILM INHOMOGENEITIES

著者名:

掲載資料名:

Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

118

発行年:

1988

開始ページ:

159

終了ページ:

166

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837883 [093183788X]

言語:

英語

請求記号:

M23500/118

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015603
シリーズID:	PA00000011
会議名:	Symposium on amorphous silicon technology
回次:	1988
会議開催地:	Reno, NV, USA
会議開催年:	1988.04.05-1988.04.08

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2 国際会議録 * VHF PLASMA DEPOSITION: A COMPARATIVE OVERVIEW Shah, A., Dutta, J., Wyrsch, N., Prasad, K., Curtins, H., Finger, F., Howling, A., Hollenstein, Ch. Materials Research Society	8 国際会議録 The "Micromorph" Cell: A New Way to High-Efficiency-Low-Temperature Crystalline Silicon Thin-Film Cell Manufacturing? Keppner, H., Torres, P., Meier, J., Platz, R., Fischer, D., Kroll, U., Dubail, S., Selvan, J. A. Anna, Vaucher, N. … MRS - Materials Research Society
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