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SYNTHESIS OF HIGHLY PHOTOSENSITIVE a-SiC:H FILMS AT HIGH DEPOSITION RATE BY PLASMA DECOMPOSITION OF SiH4 AND C2H2

著者名:
掲載資料名:
Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
118
発行年:
1988
開始ページ:
73
終了ページ:
78
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837883 [093183788X]
言語:
英語
請求記号:
M23500/118
資料種別:
国際会議録

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