*THIN (100 nm) SOS FOR APPLICATION TO BEYOND VLSI MICROELECTRONICS

*THIN (100 nm) SOS FOR APPLICATION TO BEYOND VLSI MICROELECTRONICS

著者名:

掲載資料名:

Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

107

発行年:

1988

開始ページ:

365

終了ページ:

376

総ページ数:

12

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837753 [0931837758]

言語:

英語

請求記号:

M23500/107

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015593
シリーズID:	PA00000011
会議名:	Symposium on silicon-on-insulator and buried metals in semiconductors
回次:	1987
会議開催地:	Boston, MA, USA
会議開催年:	1987.11.30-1987.12.03

類似資料:

1 国際会議録 157-nm lithography for 100-nm generation and beyond: progress and status Dao,G.T., Borodovsky,Y.A. SPIE-The International Society for Optical Engineering	7 国際会議録 Thick Film Superconductors and Their Application in the Microelectronics Technology Róbert Sali, Gábor Harsányi Society of Photo-optical Instrumentation Engineers
2 国際会議録 CMOS/SOS VLSI TECHNOLOGY Sato, T., Iwamura, J., Tango, H., Doi, K. North Holland	8 国際会議録 Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130-nm node and beyond Zhang, G., Wang, C., Tan, C.L., Ilzhoefer, J.R., Atkinson, C., Renwick, S.P., Slonaker, S.D., Godfrey, D., Fruga, C.H. SPIE-The International Society for Optical Engineering
3 国際会議録 An SOS MEMS interferometer Tejada, F., Wesolek, D.M., Lehtonen, J., Miragliotta, J.A., Andreou, A.G., Osiander, R. SPIE - The International Society of Optical Engineering	9 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75] Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., … SPIE - The International Society of Optical Engineering
4 国際会議録 Plasma Etching and Patterning of CVD Diamond at <100｡？for Microelectronics Applications Ramesham, R., Welch, W., Neely, W. C., Rose, M. F., Askew, R. F. MRS - Materials Research Society	10 国際会議録 SOS MOSFET's Merckel G. Noordhoff International Publishing
5 国際会議録 Extended ATHENA alignment performance and application for the 100-nm technology node Navarro,R., Keij,S., Boef,A.J.den, Schets,S., Bilsen,F.van, Simons,G., Schuurhuis,R., Burghoorn,J. SPIE-The International Society for Optical Engineering	11 国際会議録 DEPOSITION, CHARACTERIZATION, AND APPLICATION OF ALUMINUM NITRIDE THIN FILMS FOR MICROELECTRONICS Yu, C., Kim. S., Meikle, S., Doan, T. T., Blalock, G. Materials Research Society
6 国際会議録 Fully integrated low-power flip chip bonding of arrayed optoelectronic devices on SOS Reedy,R.E., Anthony,H., Kuznia,C., Pendelton,M., Cable,J., Richaud,J. SPIE-The International Society for Optical Engineering	12 国際会議録 Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography Park, J.-S., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M., Lee, J.-H., Shin, H.-S., Laidig, T.L., Van den Broeke, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12