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FORMATION OF BURIED OXIDE IN MEV OXYGEN IMPLANTED SILICON

著者名:
Nieh, C. W.
Xiong, F.
Ahn, C. C.
Zhou, Z.
Jamieson, D. N.
Vreeland Jr., T.
Fultz, B.
Tombrello, T. A.
さらに 3 件
掲載資料名:
Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
107
発行年:
1988
開始ページ:
73
終了ページ:
78
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837753 [0931837758]
言語:
英語
請求記号:
M23500/107
資料種別:
国際会議録

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