EFFECTS OF SILICON IMPLANTATION AND PROCESSING TEMPERATURE ON PERFORMANCE OF POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS FABRICATED FROM LOW PRESSURE CHEMICAL VAPOR DEPOSITED AMORPHOUS SILICON
- 著者名:
- 掲載資料名:
- Polysilicon films and interfaces : symposium held December 1-3, 1987, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 106
- 発行年:
- 1988
- 開始ページ:
- 305
- 終了ページ:
- 310
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837746 [093183774X]
- 言語:
- 英語
- 請求記号:
- M23500/106
- 資料種別:
- 国際会議録
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