DEGRADATION OF MICRON-SIZED SILICIDE LINES ON POLYCRYSTALLINE SILICON

DEGRADATION OF MICRON-SIZED SILICIDE LINES ON POLYCRYSTALLINE SILICON

著者名:

掲載資料名:

Polysilicon films and interfaces : symposium held December 1-3, 1987, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

106

発行年:

1988

開始ページ:

155

終了ページ:

162

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837746 [093183774X]

言語:

英語

請求記号:

M23500/106

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015592
シリーズID:	PA00000011
会議名:	Symposium on polysilicon films and interfaces
回次:	1987
会議開催地:	Boston, MA, USA
会議開催年:	1987.12.01-1987.12.03

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2 国際会議録 *SILICON TRANSPORT IN LATERAL SILICIDE GROWTH OF CrSi2 Zheng, L.R., Doolittle, L.R., Mayer, J.W. Materials Research Society	8 国際会議録 A comparison of electron energy loss spectroscopy and electron diffraction for polycrystalline and Xe+ irradiated nickel silicides Barbour, J. C., Grunes, L. A., Mayer, J. W. North-Holland
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6 国際会議録 STRUCTURE ANALYSIS OF Ni-SILICIDES FORMED IN LATERAL DIFFUSION COUPLES Chen, S. H., Barbour, J. C., Zheng, L. R., Carter, C. B., Mayer, J. W. Materials Research Society	12 国際会議録 Edge determination for polycrystalline silicon lines on gate oxide Villarrubia,J.S., Vladar,A.E., Lowney,J.R., Postek Jr.,M.T. SPIE-The International Society for Optical Engineering

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