Blank Cover Image

DEGRADATION OF TiSi2/n+-POLYSILICON INTERFACES DUE TO HIGH TEMPERATURE PROCESSING

著者名:
Shenai, K.
Piacente, P. A.
Smith, G. A.
Lewis, N.
McConnell, M . D.
Norton, J. F.
Hall, E. L.
Baliga, B. J.
さらに 3 件
掲載資料名:
Polysilicon films and interfaces : symposium held December 1-3, 1987, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
106
発行年:
1988
開始ページ:
149
終了ページ:
154
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837746 [093183774X]
言語:
英語
請求記号:
M23500/106
資料種別:
国際会議録

類似資料:

Hunt, B.D., Lewis, N., Schowalter, L.J., Hall, E.L., Turner, L.G.

Materials Research Society

Lewis, N., Shenai, K., Smith, G.A., Piacente, P.A., Baliga, B.J.

Materials Research Society

Reinbold, L., Chason, Eric, Jadhav, N., Kelly, V., Holmers, P., Shin, J.W., Chan, W.L., Kumar, K.S., Barr, G.

Materials Research Society

Shenai, K., Piacente, P.A., Lewis, N., McConnell, M.D., Smith, G.A., Baliga, B.J.

Materials Research Society

Campbell, P M, Aina, O., Baliga, B. J., Ehle, R.

North-Holland

Shenai, K., Lewis, N., Smith, G.A., Baliga, B.J.

Materials Research Society

Lee, S. S., Galovich, C. S., Fuchs, K. P., Kwong, D,.L., Hirvoven, J., Huang, J.

Materials Research Society

5 国際会議録 DOPANT DIFFUSION IN TiSi2

d'Heurle, F.M., Michel, A.E., LeGoues, F.K., Scilla, G., Wetzel, J.T., Gas, P.

Materials Research Society

Madakson, P., Clark, G. J., Legoues, F. K., d'Heurle, F. M., Baglin, J. E. E.

Materials Research Society

Schowalter, L. J., Hashimoto, Shin, Smith, G. A., Gibson, W. M., Lewis, N., Hall, E. L., Sullivan, P. W.

Materials Research Society

Hunt, B.D., Lewis, N., Hall, E.L., Turner, L.G., Schowalter, L.J., Okamoto, Masako, Hashimoto, Shin

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12