LASER PHOTOCHEMICAL GROWTH OF AMORPHOUS SILICON AT LOW TEMPERATURES AND COMPARISON WITH THERMAL CHEMICAL VAPOR DEPOSITION

LASER PHOTOCHEMICAL GROWTH OF AMORPHOUS SILICON AT LOW TEMPERATURES AND COMPARISON WITH THERMAL CHEMICAL VAPOR DEPOSITION

著者名:

掲載資料名:

Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

101

発行年:

1988

開始ページ:

355

終了ページ:

360

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837692 [0931837693]

言語:

英語

請求記号:

M23500/101

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015587
シリーズID:	PA00000011
会議名:	Symposium on laser and particle-beam chemical processing for microelectronics
回次:	1987
会議開催地:	Boston, MA, USA
会議開催年:	1987.12.01-1987.12.03

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