CARRIER AND ATOMIC DISTRIBUTIONS IN Si IMPLANTED AND RAPID THERMALLY ANNEALED InP: INFLUENCE OF DUAL IMPLANTS OF As OR p

CARRIER AND ATOMIC DISTRIBUTIONS IN Si IMPLANTED AND RAPID THERMALLY ANNEALED InP: INFLUENCE OF DUAL IMPLANTS OF As OR p

著者名:

Duhamel, Nicole

掲載資料名:

Rapid thermal processing of electronic materials : symposium held April 21-23, 1987, Anaheim California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

92

発行年:

1987

開始ページ:

443

終了ページ:

448

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837593 [0931837596]

言語:

英語

請求記号:

M23500/92

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015578
シリーズID:	PA00000011
会議名:	Symposium on rapid thermal processing of electronic materials
回次:	1987
会議開催地:	Anaheim, CA, USA
会議開催年:	1987.04.21-1987.04.23

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