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THE GROWTH OF SILICON OXIDE FILMS BY REMOTE PLASMA ENHANCED CVD

著者名:
掲載資料名:
Interfaces, superlattices, and thin films : symposium held December 1-6, 1986, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
77
発行年:
1987
開始ページ:
595
終了ページ:
602
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837562 [0931837561]
言語:
英語
請求記号:
M23500/77
資料種別:
国際会議録

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