SUBMICRON PATTERN DELINEATION USING A PULSED ELECTRO-BEAM IN SOFT VACUUM

SUBMICRON PATTERN DELINEATION USING A PULSED ELECTRO-BEAM IN SOFT VACUUM

著者名:

掲載資料名:

Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

76

発行年:

1987

開始ページ:

91

終了ページ:

98

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837425 [0931837421]

言語:

英語

請求記号:

M23500/76

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015561
シリーズID:	PA00000011
会議名:	Symposium on science and technology of microfabrication
回次:	1986
会議開催地:	Boston, MA, USA
会議開催年:	1986.12.04-1986.12.05

類似資料:

1 国際会議録 SOFT VACUUM, PULSED ELECTRON BEAM PROCESSING OF POLYMIDES Krishnaswamy, J., Li, L., Collins, G. J., Hiraoka, H., Caolo, M. A. Materials Research Society	7 国際会議録 Sub-100-nm pattern fabrication using LB resist and e-beam or synchrotron radiation excited plasma Phatak,G.J., Ogawa,S., Harun,M.Z.Bin, Morita,S. SPIE - The International Society for Optical Engineering
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