SYSTEMATIC OF SILICIDE FORMATION BY HIGH DOSE IMPLANTATION OF TRANSITION METALS INTO Si

SYSTEMATIC OF SILICIDE FORMATION BY HIGH DOSE IMPLANTATION OF TRANSITION METALS INTO Si

著者名:

掲載資料名:

Beam-solid interactions and transient processes : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

74

発行年:

1987

開始ページ:

487

終了ページ:

492

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837401 [0931837405]

言語:

英語

請求記号:

M23500/74

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015559
シリーズID:	PA00000011
会議名:	Symposium on beam-solid interactions and transient processes
回次:	1986
会議開催地:	Boston, MA, USA
会議開催年:	1986.12.01-1986.12.04

類似資料:

1 国際会議録 SILICIDE FORMATION BY HIGH DOSE TRANSITION METAL IMPLANTS INTO Si Sanchez, F.H., Namavar, F., Budnick, J.I., Fasihudin, A., Hayden, H.C. Materials Research Society	7 国際会議録 STUDY OF NEAR SURFACE STRUCTURE AND COMPOSITION FOR HIGH DOSE IMPLANTATION OF Cr+ INTO Si Namavar, F., Budnick, J. I, Hayden, H.C., Otter, F. A., Patarini, V. North-Holland
2 国際会議録 STUDY OF DOSE AND DOSE RATE IN THE IMPLANTATION OF NITROGEN ISOTOPES INTO Si(100) Namavar, F., Budnick, J.I., Fasihuddin, A., Sanchez, F.H., Hayden, H.C. Materials Research Society	8 国際会議録 ON THE FORMATIUON OF Si OXIDE BY ION IMPLANTATION Namavar, F., Budnick, J. I., Sanchez, F. H., Hayden, H. C. Materials Research Society
3 国際会議録 FORMATION OP BURIED Si02 BY HIGH DOSE IMPLANTATION OF OXYGEN AT RODM AND LIQUID NITROGEN TEMPERATURES Namavar, F., Budnick, J.I., Sanchez, F.H., Hayden, H.C. Materials Research Society	9 国際会議録 GETTERING OF IMPURITIES DURING HIGH DOSE IMPLANTATION OF Al OR Cr INTO Si AND THE RESULTING EFFECT ON STRUCTURE AND COMPOSITION namavar, F., Budnick, J. I., Otter, F. A. Materials Research Society
4 国際会議録 EXAFS STUDIES OF COBALT SILICIDE FORMATION PRODUCED BY HIGH DOSE ION IMPLANTATION Tan, Z., Budnick, J. I., Sanchez, F., Tourillon, G., Namavar, F., Hayden, H., Fasihuddin, A. F. Materials Research Society	10 国際会議録 HIGH DOSE RATE OXYGEN IMPLANTATION FOR FORMATION OF SILICON-ON-INSULATOR STRUCTURES Cortesi, E., Namavar, F., Pinizzotto, R.F., Yang, H. Materials Research Society
5 国際会議録 THE INFLUENCE OF IMPLANTATION CONDITIONS AND TARGET ORIENTATION IN HIGH DOSE IMPLANTATION OF A1+ INTO Si Namavar, F., Budnick, J. I, Fasihuddin, A., Hayden, H. C., Pease, D. A., Otter, F. A., Patarini, V. North-Holland	11 国際会議録 STRAIN RELIEF AND DEFECT FORMATION IN HIGH DOSE OXYGEN IMPLANTED SILICON Venables, D., Jones, K. S., Namavar, F., Manke, J. M. Materials Research Society
6 国際会議録 SILICIDE FORMATION IN HIGH-DOSE Fe-IMPLANTED SILICON Tan, Z., Namavar, F., Heald, S.M., Budnick, J. I., Sanchez, F. H. Materials Research Society	12 国際会議録 *EPITAXIAL GROWTH OF TRANSITION METAL SILICIDES ON SILICON Chen, L.J., Cheng, H.C., Lin, W.T. Materials Research Society

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