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EFFECTS OF RAPID THERMAL PROCESSING ON THERMAL OXIDES OF SILICON

著者名:
Lee, S.K.
Shih, D.K.
Kwong, D.J.
Alvi, N.S.
Wu, N.R.
Lee, H.S.
さらに 1 件
掲載資料名:
Materials issues in silicon integrated circuit processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
71
発行年:
1986
開始ページ:
449
終了ページ:
454
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837371 [0931837375]
言語:
英語
請求記号:
M23500/71
資料種別:
国際会議録

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