ANISOTROPIC DRY ETCHING OF SiO2 ON Si ITS IMPACT ON SURFACE AND NEAR-SURFACE PROPERTIES OF THE SUBSTRATE

ANISOTROPIC DRY ETCHING OF SiO2 ON Si ITS IMPACT ON SURFACE AND NEAR-SURFACE PROPERTIES OF THE SUBSTRATE

著者名:

Oehrlein, G.S.

掲載資料名:

Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

68

発行年:

1986

開始ページ:

367

終了ページ:

380

総ページ数:

14

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837340 [0931837340]

言語:

英語

請求記号:

M23500/68

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015554
シリーズID:	PA00000011
会議名:	Symposium on plasma processing
回次:	1986
会議開催地:	Palo Alto, CA, USA
会議開催年:	1986.04.15-1986.04.18

類似資料:

1 国際会議録 SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas Oehrlein S. G. kluwer Academic Publishers	7 国際会議録 Photocatalytic Activity of SiO2-TiO2 Nanoparticles Prepared by Sol-Hydrothermal Process Whang, C.M., Kim, Y.K., Kim, J.G., Lee, W.I., Kim, Y.H. Trans Tech Publications
2 国際会議録 Effects of 3C-SiC Intermediate Layer on the Properties of AIN Films Grown on SiO₂/Si Substrate G.S. Chung, T.W. Lee Trans Tech Publications	8 国際会議録 Correlation between Tribological Properties, sp²/sp³-Ratio and H-Content of Low-Wear Diamond-Like Carbon (DLC) Layers E. Vogli, F. Hoffmann, E. Bartis, G.S. Oehrlein, W. Tillmann Trans Tech Publications
3 国際会議録 PHOTOLUMINESCENCE OF DEFECTS PRODUCED BY REACTIVE ION ETCHING OF SILICON. NORTHROP,G.A., OEHRLEIN,G.S. Trans Tech Publications	9 国際会議録 Effect of Dry Etching in III-Nitride Surface Properties Ren, F., Lothian, J.R., Pearton, S.J., Abernathy, C.R., Vartuli, C.B., Karlicek, B., Karlicek, R.F., Jr., MacKenzie, … Electrochemical Society
4 国際会議録 Structural and Electrical Properties of Vanadium Tungsten Oxide Thin Films Grown on Pt/TiO₂/SiO₂/Si Substrates S.P. Nam, S.G. Lee, Y.H. Lee Trans Tech Publications	10 国際会議録 Bi/In thermal resist for both Si anisotropic wet etching and Si/SiO2 plasma etching Chapman, G.H., Tu, Y., Peng, J. SPIE - The International Society of Optical Engineering
5 国際会議録 Oxide Etching in Inductively Coupled Fluorocarbon Plasmas Schaepkens, M., Oehrlein, G.S. Electrochemical Society	11 国際会議録 Changes in surface characteristics of HgCdTe by dry etching Song, K.H., Yoon, T.H., Hahn, S.R., Kim, E.T., Kwon, J.H., Lee, S.G., Hwang, T.S., Lee, Y.S., Kim, J.M. SPIE
6 国際会議録 SF6/O2 and CF4/O2 Reactive-Ion-Etching-Induced Defects in Silicon Studied by Photoluminescence Spectroscopy:Role of Oxygen Buyanova,I.A., Henry,A., Monemar,B., Lindstrom,J.L., Sheinkman,M.K., Oehrlein,G.S. Trans Tech Publications	12 国際会議録 Wet and dry etching characteristics of electron beam deposited SiO and SiO2 LaRoche, J.R., Ren, F., Lothian, J.R., Hong, J., Pearton, S.J., Lambers, E. Materials Research Society

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