Blank Cover Image

ANISOTROPIC DRY ETCHING OF ALUMINUM FILMS DEPOSITED ON TOPOGRAPHIC STEPS

著者名:
Maa, Jer-shen  
掲載資料名:
Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
68
発行年:
1986
開始ページ:
59
終了ページ:
64
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837340 [0931837340]
言語:
英語
請求記号:
M23500/68
資料種別:
国際会議録

類似資料:

1 国際会議録 Effect of Argon Ion Bombardment on the Stability of Narrow Cobalt Silicide/Polysilicon Structure

Maa, Jer-Shen, Peng, Chien-Hsiung

MRS - Materials Research Society
7 国際会議録 Stability Improvement of Nickel Silicide With Co Interlayer on Si, Polysilicon and SiGe

Maa, Jer-shen, Tweet, Douglas J., Ono, Yoshi, Stecker, Lisa, Hsu, Sheng Teng

Materials Research Society
2 国際会議録 Effect of Argon Ion Bombardment of the Stability of Narrow Cobalt Silicide/Polysilicon Structure

Maa, Jer-shen, Peng, Chien-Hsiung

MRS - Materials Research Society
8 国際会議録 Analysis of Sidewall Protecting Film after Anisotropic Aluminum Etching Using a SiO2 Mask

Kawamoto, H., Miyamoto, H., Ikawa, E.

Electrochemical Society
3 国際会議録 Reaction of Amorphous Silicon with Cobalt and Nickel Silicides before Disilicide Formation

Maa, Jer-shen, Hsu, Sheng Teng

MRS - Materials Research Society
9 国際会議録 Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition

Zhang, Fengyan, Hsu, Sheng Teng, Maa, Jer-Shen, Ono, Yoshi, Hong, Ying, Zhuang, Weiwei, Ohnishi, Shigeo, Zhen, Wendong, …

Materials Research Society
4 国際会議録 X-ray Techniques for Silicides

Tweet, Douglas J., Maa, Jer-shen, Hsu, Sheng Teng

Materials Research Society
10 国際会議録 Microstresses in Molybdenum Nitride Thin Films Deposited by Reactive DC Magnetron Sputtering

Shen, Y. G.

Trans Tech Publications
5 国際会議録 Relaxation of Strained SiGe on Insulator by Direct Wafer Bonding

Maa, Jer-shen, Lee, Jong-Jan, Tweet, Douglas, Hsu, Sheng Teng

Materials Research Society
11 国際会議録 Effect of Graded AlxGa₁₋xN Interlayer Buffer on the Strain of GaN Grown on Si (111) Using MOCVD Method

KungLiang Lin, Edward-Yi Chang, Tingkai Li, Wei-Ching Huang, Yu-Lin Hsiao, Douglas Tweet, Jer-shen Maa, Sheng-Teng Hsu

Materials Research Society
6 国際会議録 Thermal stability of Ir/TaN electrode/Barrier on thin gate oxide for MFMOS one transistor memory application

Zhang, Fengyan, Hsu, Sheng Teng, Li, Tingkai, Ono, Yoshi, Maa, Jer-shen, Ying, Hong, Stecker, Lisa

MRS-Materials Research Society
12 国際会議録 The Dry Cleaning Method to Remove Polymer Layer Deposited on Etching Chamber Wall

Seo, K.I., Shin, J.C., Kang, C.J, Han, M.S., Mun, J.T., Koh, Y.B.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12