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USING RAPID THERMAL ANNEAING TO IMPROVE EPITAXIAL CaF2/CoSi2/Si (111) STRUCTURES

著者名:
掲載資料名:
Heteroepitaxy on silicon : symposium held April 16-18, 1986, Palo Alto, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
67
発行年:
1986
開始ページ:
115
終了ページ:
118
総ページ数:
4
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837333 [0931837332]
言語:
英語
請求記号:
M23500/67
資料種別:
国際会議録

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