REACTIVE SPUTTERING DEPOSITION OF TITANIUM OXIDE FILMS BYU MEANS OF AN RF TRIODE SPUTTERING SOURCE

REACTIVE SPUTTERING DEPOSITION OF TITANIUM OXIDE FILMS BYU MEANS OF AN RF TRIODE SPUTTERING SOURCE

著者名:

掲載資料名:

Defect properties and processing of high-technology nonmetallic materials : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

60

発行年:

1986

開始ページ:

373

終了ページ:

378

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837258 [0931837251]

言語:

英語

請求記号:

M23500/60

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015546
シリーズID:	PA00000011
会議名:	Symposium on defect properties and processing of high-technology nonmetallic materials
回次:	1985
会議開催地:	Boston, MA, USA
会議開催年:	1985.12.02-1985.12.04

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2 国際会議録 RF AEROSOL MIST PLASMA DEPOSITION OF OXIDE FILMS Williams, J. A. A., Shen, C. Q., Vuong, K. D., Tenpas, E., Condrate, R. A., Sr., Lee, D. H., Wang, H., Fagan, J., Wang, … MRS - Materials Research Society	8 国際会議録 A Multi-Technique Study of Titanium Nitride Films Deposited via Reactive Sputter Deposition Walker, C. G. H., Morton, S. A., Charnock, J. M., MacLean, E. J., Brown, N. M. D. Trans Tech Publications
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