COMPOUND FORMATION AND SILICON BEHAVIOR IN TITANIUM AND TANTALUM LAYERED ALUMINUM FILMS
- 著者名:
Shen, B.W. Anthony, J.M. Chang, P.-H. Keenan, J. Matyi, R. Tsai, H.L. - 掲載資料名:
- Thin films : interfaces and phenomena : symposium held December 2-6, 1985, Boston, Massachusetts, USA
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 54
- 発行年:
- 1985
- 開始ページ:
- 103
- 終了ページ:
- 108
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837197 [0931837197]
- 言語:
- 英語
- 請求記号:
- M23500/54
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
THE EFFECTS OF ANNEALING TEMPERATURE ON THE CEARACTERISTICS OF BURIED OXIDE SILICON-ON-INSULATOR
Materials Research Society |
MRS - Materials Research Society |
2
国際会議録
THE STRUCTURES OF TANTALUM PENTOXIDE FILM FORMED BY REACTIVE DC MAGNETRON SPUTTER-DEPOSITION OF Ta
Materials Research Society |
8
国際会議録
Simulation of Transitional & Turbulent Boundary Layer Flow on Blunted Geometry in Hypersonic Flow
ESA Publications Division |
Materials Research Society |
Materials Research Society |
Trans Tech Publications |
MRS - Materials Research Society |
5
国際会議録
The Influence of Stress on the Growth of Titanium Silicide Thin Films on (001) Silicon Substrates
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |