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*DOPANT REDISTRIBUTION DURING SILICIDE FORMATION

著者名:
Ohdomari, I.
Konuma, K.
Takano, M.
Chikyow, T.
Kawarada, H.
Nakanishi, J.
Ueno, T.
さらに 2 件
掲載資料名:
Thin films : interfaces and phenomena : symposium held December 2-6, 1985, Boston, Massachusetts, USA
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
54
発行年:
1985
開始ページ:
63
終了ページ:
72
総ページ数:
10
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837197 [0931837197]
言語:
英語
請求記号:
M23500/54
資料種別:
国際会議録

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