Blank Cover Image

INTERPRETATION OF UV REFLECTANCE MEASUREMENTS ON SILICON-ON-SAPPHIRE BY SPECTRAL REFLECTANCE AND SPECTROSCOPIC ELLIPSOMETRY STUDIES

著者名:
Pickering, C.
Hodge, A.M.
Daw, A.C.
Robbins, D.J.
Pearson, P.J.
Greef, R.
さらに 1 件
掲載資料名:
Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
53
発行年:
1985
開始ページ:
317
終了ページ:
322
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837180 [0931837189]
言語:
英語
請求記号:
M23500/53
資料種別:
国際会議録

類似資料:

1 国際会議録 IN-SITU DUAL-WAVELENGTH ELLIPSOMETRY AND LIGHT SCATTERING MONITORING OF Si/Si1-xGex HETEROSTRUCTURES AND MULTI-QUANTUM WELLS

Pickering, C., Hope, D. A. O., Leong, W. H., Robbins, D. J., Greef, R.

MRS - Materials Research Society
7 国際会議録 Bidirectional reflectance measurements for high-resolution signature modeling

Thomas,D.J., Jafolla,J.C., Sarman,P.J.

SPIE-The International Society for Optical Engineering
2 国際会議録 IN-SITU ELLIPSOMETRY AND LIGHT SCATTERING STUDIES OF SUBSTRATE CLEANING AND INITIAL LAYER DEPOSITION IN LOW TEMPERATURE CVD OF CRYSTALLINE sI

Pickering, C., Robbins, D. J., Young, I. M., Glasper, J. L., Johnson, M., Jones, R,.

Materials Research Society
8 国際会議録 CHARACTERIZATION OF PSEUDOMORPHIC Si/Si1-xGex MULTI-QUANTUM WELL STRUCTURES BY SPECTROSCOPIC ELLIPSOMETRY

Carline, Roger T., Pickering, Christopher, Leong, Weng Y., Robbins, David J.

MRS - Materials Research Society
3 国際会議録 Optical Anisotropy Studies of Sapphire by Raman Scattering and Spectroscopic Transmission Ellipsometry

Yao, H., Yan, C. H., DenBaars, S. P., Zavada, J. M.

MRS - Materials Research Society
9 国際会議録 Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry

Burns, S.D., Schmid, G.M., Trinque, B.C., Willson, J., Wunderlich, J., Tsiartas, P.C., Taylor, J.C., Burns, R.L., …

SPIE-The International Society for Optical Engineering
4 国際会議録 IR spectroscopic ellipsometry for industrial characterization of semiconductors

Boher,P., Bucchia,M., Piel,J.P., Defranoux,C., Stehle,J.L., Pickering,C.

SPIE-The International Society for Optical Engineering
10 国際会議録 SURFACE ROUGHNESS CHARACTERIZATION OF Al FILMS BY SPECTROSCOPIC ELLIPSOMETRY

Blanco, J.R., Vedam, K., McMarr, P.J., Bennett, J.M.

Materials Research Society
5 国際会議録 Thin Film Measurements by Spectroscopic Ellipsometry Over an Extended Range

Cox, J.N., Hutchinson, J.M., Lee, K.K.D., Sheridan, B., Wong, R., Yang, I.-C.J.

Electrochemical Society
11 国際会議録 REAL TIME OBSERVATION OF PERIODIC STEP ARRAYS DURING SILICON VAPOUR PHASE HOMOEPITAXY

Robbins, D. J., Young, I. M., Pidduck, A. J., Pickering, C., Glasper, J. L., Gasson, D. B.

Materials Research Society
6 国際会議録 REFLECTANCE ANISOTROPY AND SPECTROSCOPIC ELLIPSOMETRY CHARACTERISATION OF WET SILICON WAFER CLEANING

Beechinor, J. T., Kelly, P. V., Crean, G. M.

MRS - Materials Research Society
12 国際会議録 Improved gate process control at the 130-nm node using spectroscopic-ellipsometry-based profile metrology

Hodges, J.S., Lin, Y.-L.C., Burrows, D.R., Chiao, R.H., Peters, R.M., Rangarajan, S., Bhatia, K.N., Lakkapragada, S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12