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RECRYSTALLIZATION KINETICS DURING FAST THERMAL ANNEALING OF PF+n IMPLANTED SILICON

著者名:
掲載資料名:
Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
52
発行年:
1985
開始ページ:
115
終了ページ:
122
総ページ数:
8
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837173 [0931837170]
言語:
英語
請求記号:
M23500/52
資料種別:
国際会議録

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