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A SIMPLE MODEL FOR THE TRANSIENT, ENHANCED DIFFUSION OF ION-IMPLANTED PHOSPHOROUS IN SILICON

著者名:
掲載資料名:
Energy beam-solid interactions and transient thermal processing/1984 : symposium held November 26-30, 1984, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
35
発行年:
1985
開始ページ:
341
終了ページ:
346
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837005 [0931837006]
言語:
英語
請求記号:
M23500/35
資料種別:
国際会議録

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