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THE FORMATION OF POROUS SILICON AND ITS APPLICATIONS TO DIELECTRIC ISOLATION

著者名:
Frye, R. C.  
掲載資料名:
Comparison of thin film transistor and SOI technologies : symposium held February 1984 in Albuquerque, New Mexico, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
33
発行年:
1984
開始ページ:
53
終了ページ:
62
総ページ数:
10
出版情報:
New York: North Holland
ISSN:
02729172
ISBN:
9780444008992 [0444008993]
言語:
英語
請求記号:
M23500/33
資料種別:
国際会議録

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